Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Jo-Hyon Noh, Michael G. Stanford, Bret B. Lewis, Jason D. Fowlkes, Harald Plank, Philip D. Rack^*

^*Corresponding author for this work

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

1 results

Finished
Functional Nanofabrication
Dohr, J., Plank, H., Rosker, S., Winkler, R., Stermitz, M., Reisecker, V., Michelitsch, S. G. W., Brugger-Hatzl, M., Schmied, R., Eicher, B., Orthacker, A., Arnold, G., Sattelkow, J., Kolb, F., Ganner, T., Haselmann, U., Seewald, L. & Aschl, T.
1/01/09 → 31/12/23
Project: Research project