Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Jo-Hyon Noh, Michael G. Stanford, Bret B. Lewis, T. Liang, Jason D. Fowlkes, Harald Plank, Philip D. Rack

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)1705-1713
JournalApplied Physics / A
Volume117
Issue number4
DOIs
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Application
  • Experimental

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