Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Jo-Hyon Noh, Michael G. Stanford, Bret B. Lewis, T. Liang, Jason D. Fowlkes, Harald Plank, Philip D. Rack

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)1705-1713
JournalApplied Physics / A
Volume117
Issue number4
DOIs
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Application
  • Experimental

Cite this

Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair. / Noh, Jo-Hyon; Stanford, Michael G.; Lewis, Bret B.; Liang, T.; Fowlkes, Jason D.; Plank, Harald; Rack, Philip D.

In: Applied Physics / A, Vol. 117, No. 4, 2014, p. 1705-1713.

Research output: Contribution to journalArticleResearchpeer-review

Noh, Jo-Hyon ; Stanford, Michael G. ; Lewis, Bret B. ; Liang, T. ; Fowlkes, Jason D. ; Plank, Harald ; Rack, Philip D. / Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair. In: Applied Physics / A. 2014 ; Vol. 117, No. 4. pp. 1705-1713.
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AU - Noh, Jo-Hyon

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AU - Fowlkes, Jason D.

AU - Plank, Harald

AU - Rack, Philip D.

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JO - Applied Physics / A

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