Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers

Martin Kleindienst, Stefan Koch, Markus Reichhartinger

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

This paper proposes a model-based control approach for a liquid flow heater operated within silicon wafer processing tools used in the semiconductor industry. A distributed-parameter model is presented to describe the thermal dynamic behavior of the heater. Adopting the early-lumping approach, an observer-based controller is designed. This controller ensures a vanishing steady-state error in the case of constant input signals and disturbances. The implemented feedback loop relies on an observer-based anti-windup technique. Real-world tests demonstrate the effectiveness and feasibility of the proposed approach.

Original languageEnglish
Title of host publicationCCTA 2020 - 4th IEEE Conference on Control Technology and Applications
Pages611-618
Number of pages8
ISBN (Electronic)9781728171401
DOIs
Publication statusPublished - Aug 2020
Event4th IEEE Conference on Control Technology and Applications: CCTA 2020 - Virtual, Montreal, Canada
Duration: 24 Aug 202026 Aug 2020

Conference

Conference4th IEEE Conference on Control Technology and Applications
CountryCanada
CityVirtual, Montreal
Period24/08/2026/08/20

ASJC Scopus subject areas

  • Control and Optimization
  • Instrumentation
  • Computer Science Applications

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