This paper proposes a model-based control approach for a liquid flow heater used to process silicon wafers in the semiconductor industry. A distributed-parameter model is presented to describe the thermal behavior of the heater. Adopting the early-lumping approach, an observer-based controller is designed. This controller ensures a vanishing steady state error in the case of constant input signals and disturbances. The implemented feedback loop relies on an anti-windup technique, which is based on the observer. Real-world tests demonstrate the effectiveness and feasibility of the proposed approach.
|Publikationsstatus||Veröffentlicht - 2020|
|Veranstaltung||IEEE Conference on Control Technology and Applications (CCTA) - Montreal, Kanada|
Dauer: 24 Aug 2020 → 26 Aug 2020
|Konferenz||IEEE Conference on Control Technology and Applications (CCTA)|
|Zeitraum||24/08/20 → 26/08/20|
Kleindienst, M., Koch, S., & Reichhartinger, M. (2020). Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers. Beitrag in IEEE Conference on Control Technology and Applications (CCTA), Montreal, Kanada.