Abstract
This paper proposes a model-based control approach for a liquid flow heater operated within silicon wafer processing tools used in the semiconductor industry. A distributed-parameter model is presented to describe the thermal dynamic behavior of the heater. Adopting the early-lumping approach, an observer-based controller is designed. This controller ensures a vanishing steady-state error in the case of constant input signals and disturbances. The implemented feedback loop relies on an observer-based anti-windup technique. Real-world tests demonstrate the effectiveness and feasibility of the proposed approach.
Originalsprache | englisch |
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Titel | CCTA 2020 - 4th IEEE Conference on Control Technology and Applications |
Seiten | 611-618 |
Seitenumfang | 8 |
ISBN (elektronisch) | 9781728171401 |
DOIs | |
Publikationsstatus | Veröffentlicht - Aug. 2020 |
Veranstaltung | 4th IEEE Conference on Control Technology and Applications: CCTA 2020 - Virtual, Montreal, Kanada Dauer: 24 Aug. 2020 → 26 Aug. 2020 |
Konferenz
Konferenz | 4th IEEE Conference on Control Technology and Applications |
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Land/Gebiet | Kanada |
Ort | Virtual, Montreal |
Zeitraum | 24/08/20 → 26/08/20 |
ASJC Scopus subject areas
- Steuerung und Optimierung
- Instrumentierung
- Angewandte Informatik