Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks

Min Tu, Benzheng Xia, Dmitry E Kravchenko, Max Lutz Tietze, Alexander John Cruz, Ivo Stassen, Tom Hauffman, Joan Teyssandier, Steven De Feyter, Zheng Wang, Roland A Fischer, Benedetta Marmiroli, Heinz Amenitsch, Ana Torvisco Gomez, Miriam Velasquez Hernandez, Paolo Falcaro, Rob Ameloot^*

^*Corresponding author for this work