[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE

Frank Wiesbrock (Inventor), Franz Stelzer (Inventor), Verena Schenk (Inventor), Lisa Ellmaier (Inventor)

Research output: PatentResearch

Original languageEnglish
Patent numberWO 2013/036979 A1
Publication statusPublished - 21 Mar 2013

Fields of Expertise

  • Advanced Materials Science

Cite this

Wiesbrock, F., Stelzer, F., Schenk, V., & Ellmaier, L. (2013). [DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE. (Patent No. WO 2013/036979 A1).

[DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE. / Wiesbrock, Frank (Inventor); Stelzer, Franz (Inventor); Schenk, Verena (Inventor); Ellmaier, Lisa (Inventor).

Patent No.: WO 2013/036979 A1.

Research output: PatentResearch

Wiesbrock, F, Stelzer, F, Schenk, V & Ellmaier, L 2013, [DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE, Patent No. WO 2013/036979 A1.
Wiesbrock F, Stelzer F, Schenk V, Ellmaier L, inventors. [DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE. WO 2013/036979 A1. 2013 Mar 21.
Wiesbrock, Frank (Inventor) ; Stelzer, Franz (Inventor) ; Schenk, Verena (Inventor) ; Ellmaier, Lisa (Inventor). / [DE] FOTOLACK; [EN] PHOTORESIST; [FR] LAQUE PHOTOSENSIBLE. Patent No.: WO 2013/036979 A1.
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