Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Cara M. Doherty*, Gianluca Grenci, Raffaele Riccò, James I. Mardel, Julien Reboul, Shuhei Furukawa, Susumu Kitagawa, Anita J. Hill, Paolo Falcaro

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

Original languageEnglish
Pages (from-to)4701-4705
Number of pages5
JournalAdvanced Materials
Volume25
Issue number34
DOIs
Publication statusPublished - 14 Sep 2013
Externally publishedYes

Keywords

  • device fabrication
  • imprinting
  • metal-organic frameworks
  • patterning
  • UV lithography

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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