Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Cara M. Doherty, Gianluca Grenci, Raffaele Riccò, James I. Mardel, Julien Reboul, Shuhei Furukawa, Susumu Kitagawa, Anita J. Hill, Paolo Falcaro

Research output: Contribution to journalArticleResearchpeer-review

Abstract

Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

Original languageEnglish
Pages (from-to)4701-4705
Number of pages5
JournalAdvanced Materials
Volume25
Issue number34
DOIs
Publication statusPublished - 14 Sep 2013
Externally publishedYes

Fingerprint

Lithography
Metals
Lab-on-a-chip
Powders

Keywords

  • device fabrication
  • imprinting
  • metal-organic frameworks
  • patterning
  • UV lithography

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Combining UV lithography and an imprinting technique for patterning metal-organic frameworks. / Doherty, Cara M.; Grenci, Gianluca; Riccò, Raffaele; Mardel, James I.; Reboul, Julien; Furukawa, Shuhei; Kitagawa, Susumu; Hill, Anita J.; Falcaro, Paolo.

In: Advanced Materials, Vol. 25, No. 34, 14.09.2013, p. 4701-4705.

Research output: Contribution to journalArticleResearchpeer-review

Doherty, CM, Grenci, G, Riccò, R, Mardel, JI, Reboul, J, Furukawa, S, Kitagawa, S, Hill, AJ & Falcaro, P 2013, 'Combining UV lithography and an imprinting technique for patterning metal-organic frameworks' Advanced Materials, vol. 25, no. 34, pp. 4701-4705. https://doi.org/10.1002/adma.201301383
Doherty, Cara M. ; Grenci, Gianluca ; Riccò, Raffaele ; Mardel, James I. ; Reboul, Julien ; Furukawa, Shuhei ; Kitagawa, Susumu ; Hill, Anita J. ; Falcaro, Paolo. / Combining UV lithography and an imprinting technique for patterning metal-organic frameworks. In: Advanced Materials. 2013 ; Vol. 25, No. 34. pp. 4701-4705.
@article{b254c058ad8e4288bb54ee6459c76271,
title = "Combining UV lithography and an imprinting technique for patterning metal-organic frameworks",
abstract = "Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.",
keywords = "device fabrication, imprinting, metal-organic frameworks, patterning, UV lithography",
author = "Doherty, {Cara M.} and Gianluca Grenci and Raffaele Ricc{\`o} and Mardel, {James I.} and Julien Reboul and Shuhei Furukawa and Susumu Kitagawa and Hill, {Anita J.} and Paolo Falcaro",
year = "2013",
month = "9",
day = "14",
doi = "10.1002/adma.201301383",
language = "English",
volume = "25",
pages = "4701--4705",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH",
number = "34",

}

TY - JOUR

T1 - Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

AU - Doherty, Cara M.

AU - Grenci, Gianluca

AU - Riccò, Raffaele

AU - Mardel, James I.

AU - Reboul, Julien

AU - Furukawa, Shuhei

AU - Kitagawa, Susumu

AU - Hill, Anita J.

AU - Falcaro, Paolo

PY - 2013/9/14

Y1 - 2013/9/14

N2 - Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

AB - Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

KW - device fabrication

KW - imprinting

KW - metal-organic frameworks

KW - patterning

KW - UV lithography

UR - http://www.scopus.com/inward/record.url?scp=84883827180&partnerID=8YFLogxK

U2 - 10.1002/adma.201301383

DO - 10.1002/adma.201301383

M3 - Article

VL - 25

SP - 4701

EP - 4705

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 34

ER -