Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Cara M. Doherty; Gianluca Grenci; Raffaele Riccò; James I. Mardel; Julien Reboul; Shuhei Furukawa; Susumu Kitagawa; Anita J. Hill; Paolo Falcaro

doi:10.1002/adma.201301383

Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Cara M. Doherty^*, Gianluca Grenci, Raffaele Riccò, James I. Mardel, Julien Reboul, Shuhei Furukawa, Susumu Kitagawa, Anita J. Hill, Paolo Falcaro

^*Korrespondierende/r Autor/-in für diese Arbeit

Publikation: Beitrag in einer Fachzeitschrift › Artikel › Begutachtung

Abstract

Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

Originalsprache	englisch
Seiten (von - bis)	4701-4705
Seitenumfang	5
Fachzeitschrift	Advanced Materials
Jahrgang	25
Ausgabenummer	34
DOIs	https://doi.org/10.1002/adma.201301383
Publikationsstatus	Veröffentlicht - 14 Sept. 2013
Extern publiziert	Ja

ASJC Scopus subject areas

Werkstoffwissenschaften (insg.)
Werkstoffmechanik
Maschinenbau

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title = "Combining UV lithography and an imprinting technique for patterning metal-organic frameworks",

abstract = "Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.",

keywords = "device fabrication, imprinting, metal-organic frameworks, patterning, UV lithography",

author = "Doherty, {Cara M.} and Gianluca Grenci and Raffaele Ricc{\`o} and Mardel, {James I.} and Julien Reboul and Shuhei Furukawa and Susumu Kitagawa and Hill, {Anita J.} and Paolo Falcaro",

year = "2013",

month = sep,

day = "14",

doi = "10.1002/adma.201301383",

language = "English",

volume = "25",

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journal = "Advanced Materials",

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T1 - Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

AU - Doherty, Cara M.

AU - Grenci, Gianluca

AU - Riccò, Raffaele

AU - Mardel, James I.

AU - Reboul, Julien

AU - Furukawa, Shuhei

AU - Kitagawa, Susumu

AU - Hill, Anita J.

AU - Falcaro, Paolo

PY - 2013/9/14

Y1 - 2013/9/14

N2 - Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

AB - Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.

KW - device fabrication

KW - imprinting

KW - metal-organic frameworks

KW - patterning

KW - UV lithography

UR - http://www.scopus.com/inward/record.url?scp=84883827180&partnerID=8YFLogxK

U2 - 10.1002/adma.201301383

DO - 10.1002/adma.201301383

M3 - Article

AN - SCOPUS:84883827180

SN - 0935-9648

VL - 25

SP - 4701

EP - 4705

JO - Advanced Materials

JF - Advanced Materials

IS - 34

ER -

Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Abstract

ASJC Scopus subject areas

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