Model Predictive Temperature Control of a Distribution System for Chemicals

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Abstract

In semiconductor manufacturing tight temperature control of chemicals is crucial for meeting clean application requirements. The use of multiple chemistries as well as various configuration options makes precise temperature control a challenging task. In this paper a generic solution for the temperature control in a single wafer manufacturing machinery for wet-chemical processing based on a model predictive control technique is presented. The developed control strategy is implemented and evaluated on a real world unit with realistic wafer cleaning recipes.
Originalspracheenglisch
TitelDynamics and Control of Advanced Structures and Machines
Redakteure/-innenHans Irschik, Alexander Belyaev, Michael Krommer
Herausgeber (Verlag)Springer International Publishing AG
Seiten109
Seitenumfang117
Auflage1
ISBN (elektronisch)978-3-319-43080-5
DOIs
PublikationsstatusVeröffentlicht - 2017

Treatment code (Nähere Zuordnung)

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