In semiconductor manufacturing tight temperature control of chemicals is crucial for meeting clean application requirements. The use of multiple chemistries as well as various configuration options makes precise temperature control a challenging task. In this paper a generic solution for the temperature control in a single wafer manufacturing machinery for wet-chemical processing based on a model predictive control technique is presented. The developed control strategy is implemented and evaluated on a real world unit with realistic wafer cleaning recipes.
|Title of host publication||Dynamics and Control of Advanced Structures and Machines|
|Editors||Hans Irschik, Alexander Belyaev, Michael Krommer|
|Publisher||Springer International Publishing AG|
|Publication status||Published - 2017|
Treatment code (Nähere Zuordnung)