In semiconductor manufacturing tight temperature control of chemicals is crucial for meeting clean application requirements. The use of multiple chemistries as well as various configuration options makes precise temperature control a challenging task. In this paper a generic solution for the temperature control in a single wafer manufacturing machinery for wet-chemical processing based on a model predictive control technique is presented. The developed control strategy is implemented and evaluated on a real world unit with realistic wafer cleaning recipes.
|Title of host publication||Dynamics and Control of Advanced Structures and Machines|
|Editors||Hans Irschik, Alexander Belyaev, Michael Krommer|
|Publisher||Springer International Publishing AG|
|Number of pages||117|
|Publication status||Published - 2017|
Treatment code (Nähere Zuordnung)
Koch, S., Ponikvar, M., Steinberger, M., & Horn, M. (2017). Model Predictive Temperature Control of a Distribution System for Chemicals. In H. Irschik, A. Belyaev, & M. Krommer (Eds.), Dynamics and Control of Advanced Structures and Machines (1 ed., pp. 109). Springer International Publishing AG . https://doi.org/10.1007/978-3-319-43080-5_12