Model Predictive Temperature Control of a Distribution System for Chemicals

Research output: Chapter in Book/Report/Conference proceedingChapterResearchpeer-review

Abstract

In semiconductor manufacturing tight temperature control of chemicals is crucial for meeting clean application requirements. The use of multiple chemistries as well as various configuration options makes precise temperature control a challenging task. In this paper a generic solution for the temperature control in a single wafer manufacturing machinery for wet-chemical processing based on a model predictive control technique is presented. The developed control strategy is implemented and evaluated on a real world unit with realistic wafer cleaning recipes.
Original languageEnglish
Title of host publicationDynamics and Control of Advanced Structures and Machines
EditorsHans Irschik, Alexander Belyaev, Michael Krommer
PublisherSpringer International Publishing AG
Pages109
Number of pages117
Edition1
ISBN (Electronic)978-3-319-43080-5
DOIs
Publication statusPublished - 2017

    Fingerprint

Treatment code (Nähere Zuordnung)

  • Application

Cite this

Koch, S., Ponikvar, M., Steinberger, M., & Horn, M. (2017). Model Predictive Temperature Control of a Distribution System for Chemicals. In H. Irschik, A. Belyaev, & M. Krommer (Eds.), Dynamics and Control of Advanced Structures and Machines (1 ed., pp. 109). Springer International Publishing AG . https://doi.org/10.1007/978-3-319-43080-5_12