Model Predictive Temperature Control of a Distribution System for Chemicals

Stefan Koch; Matija Ponikvar; Martin Steinberger; Martin Horn

doi:10.1007/978-3-319-43080-5_12

Model Predictive Temperature Control of a Distribution System for Chemicals

Stefan Koch, Matija Ponikvar, Martin Steinberger, Martin Horn

Institute of Automation and Control (4430)

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

Abstract

In semiconductor manufacturing tight temperature control of chemicals is crucial for meeting clean application requirements. The use of multiple chemistries as well as various configuration options makes precise temperature control a challenging task. In this paper a generic solution for the temperature control in a single wafer manufacturing machinery for wet-chemical processing based on a model predictive control technique is presented. The developed control strategy is implemented and evaluated on a real world unit with realistic wafer cleaning recipes.

Original language	English
Title of host publication	Dynamics and Control of Advanced Structures and Machines
Editors	Hans Irschik, Alexander Belyaev, Michael Krommer
Publisher	Springer International Publishing AG
Pages	109-117
Edition	1
ISBN (Electronic)	978-3-319-43080-5
DOIs	https://doi.org/10.1007/978-3-319-43080-5_12
Publication status	Published - 2017

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Model Predictive Temperature Control of a Distribution System for Chemicals. / Koch, Stefan; Ponikvar, Matija; Steinberger, Martin et al.
Dynamics and Control of Advanced Structures and Machines. ed. / Hans Irschik; Alexander Belyaev; Michael Krommer. 1. ed. Springer International Publishing AG , 2017. p. 109-117.

Research output: Chapter in Book/Report/Conference proceeding › Chapter › peer-review

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Model Predictive Temperature Control of a Distribution System for Chemicals

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