Low-temperature solid-phase epitaxy of defect-free aluminum p +-doped silicon for nanoscale device applications

Yann Civale*, Lis K. Nanver, Peter Hadley, Egbert J G Goudena, Henk W. Van Zeijl, Hugo Schellevis

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

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