H+ implantation profile formation in m: Cz and Fz silicon

S. Kirnstoetter*, M. Faccinelli, P. Hadley, M. Jelinek, W. Schustereder, J. G. Laven, H. J. Schulze

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference paper

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy