Hard X-rays meet soft matter: When bottom-up and top-down get along well

Plinio Innocenzi*, Luca Malfatti, Paolo Falcaro

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

The combined approach of bottom-up and top-down routes allows direct soft matter patterning and fabrication of devices using faster and more versatile protocols. In this research news, we briefly describe some of the fundamentals, development, recent progress and perspectives in the fabrication and patterning of functional nanostructured materials by interaction with high energy X-rays.

Original languageEnglish
Pages (from-to)3722-3729
Number of pages8
JournalSoft Matter
Volume8
Issue number14
DOIs
Publication statusPublished - 14 Apr 2012
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics

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