Event correlation on the basis of Activation Patterns

Peter Teufl; Udo Payer; Reinhard Fellner

doi:http://doi.ieeecomputersociety.org/10.1109/PDP.2010.80

Event correlation on the basis of Activation Patterns

Peter Teufl, Udo Payer, Reinhard Fellner

Institute of Applied Information Processing and Communications (7050)

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

Original language	English
Title of host publication	IEEE
Publisher	IEEE Computer Society
Pages	631-640
ISBN (Print)	978-0-7695-3939-3
DOIs	https://doi.org/http://doi.ieeecomputersociety.org/10.1109/PDP.2010.80
Publication status	Published - 2010
Event	Proceedings of the 18th Euromicro Conference on Parallel, Distributed and Network-based Processing, PDP 2010, Pisa, Italy, February 17-19, 2010 - Pisa, Italy Duration: 17 Feb 2010 → 19 Feb 2010

Publication series

Name	PDP
Publisher	IEEE Computer Society

Conference

Conference	Proceedings of the 18th Euromicro Conference on Parallel, Distributed and Network-based Processing, PDP 2010, Pisa, Italy, February 17-19, 2010
Country/Territory	Italy
City	Pisa
Period	17/02/10 → 19/02/10

Treatment code (Nähere Zuordnung)

Theoretical
Experimental

Access to Document

http://doi.ieeecomputersociety.org/10.1109/PDP.2010.80

paper.pdfFinal published version, 1.64 MB

Cite this

Teufl, P, Payer, U & Fellner, R 2010, Event correlation on the basis of Activation Patterns. in IEEE. PDP, IEEE Computer Society, pp. 631-640, Proceedings of the 18th Euromicro Conference on Parallel, Distributed and Network-based Processing, PDP 2010, Pisa, Italy, February 17-19, 2010, Pisa, Italy, 17/02/10. https://doi.org/http://doi.ieeecomputersociety.org/10.1109/PDP.2010.80

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title = "Event correlation on the basis of Activation Patterns",

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AU - Teufl, Peter

AU - Payer, Udo

AU - Fellner, Reinhard

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SN - 978-0-7695-3939-3

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BT - IEEE

PB - IEEE Computer Society

T2 - Proceedings of the 18th Euromicro Conference on Parallel, Distributed and Network-based Processing, PDP 2010, Pisa, Italy, February 17-19, 2010

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