Controlling Chemistry, Structure and Volume Growth Rate via Process Parameters of Electron Beam Induced Deposition

Harald Plank, Thomas Haber, Christian Gspan, Gerald Kothleitner, Ferdinand Hofer

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publicationMaterials Science
Place of PublicationWien
PublisherFacultas
Pages101-102
ISBN (Print)978-3-85125-062-6
DOIs
Publication statusPublished - 2009
EventMultinational Congress on Microscopy - Graz, Austria
Duration: 30 Aug 20094 Sep 2009

Conference

ConferenceMultinational Congress on Microscopy
CountryAustria
CityGraz
Period30/08/094/09/09

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Controlling Chemistry, Structure and Volume Growth Rate via Process Parameters of Electron Beam Induced Deposition. / Plank, Harald; Haber, Thomas; Gspan, Christian; Kothleitner, Gerald; Hofer, Ferdinand.

Materials Science. Wien : Facultas, 2009. p. 101-102.

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Plank, H, Haber, T, Gspan, C, Kothleitner, G & Hofer, F 2009, Controlling Chemistry, Structure and Volume Growth Rate via Process Parameters of Electron Beam Induced Deposition. in Materials Science. Facultas, Wien, pp. 101-102, Multinational Congress on Microscopy, Graz, Austria, 30/08/09. https://doi.org/10.3217/978-3-85125-062-6-423
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