Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications

Archim Wolfberger, Alexander Fian, Andreas Petritz, Jakob Herka, Volker Schmidt, Barbara Stadlober, Rupert Kargl, Stefan Spirk, Thomas Grießer

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Originalspracheenglisch
Seiten (von - bis)717-727
FachzeitschriftCellulose
Jahrgang22
DOIs
PublikationsstatusVeröffentlicht - 2015

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Application

Dies zitieren

Wolfberger, A., Fian, A., Petritz, A., Herka, J., Schmidt, V., Stadlober, B., ... Grießer, T. (2015). Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications. Cellulose, 22, 717-727. https://doi.org/10.1007/s10570-014-0471-4

Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications. / Wolfberger, Archim; Fian, Alexander; Petritz, Andreas; Herka, Jakob; Schmidt, Volker; Stadlober, Barbara; Kargl, Rupert; Spirk, Stefan; Grießer, Thomas.

in: Cellulose, Jahrgang 22, 2015, S. 717-727.

Publikation: Beitrag in einer FachzeitschriftArtikelForschungBegutachtung

Wolfberger, A, Fian, A, Petritz, A, Herka, J, Schmidt, V, Stadlober, B, Kargl, R, Spirk, S & Grießer, T 2015, 'Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications' Cellulose, Jg. 22, S. 717-727. https://doi.org/10.1007/s10570-014-0471-4
Wolfberger, Archim ; Fian, Alexander ; Petritz, Andreas ; Herka, Jakob ; Schmidt, Volker ; Stadlober, Barbara ; Kargl, Rupert ; Spirk, Stefan ; Grießer, Thomas. / Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications. in: Cellulose. 2015 ; Jahrgang 22. S. 717-727.
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AU - Wolfberger, Archim

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AU - Herka, Jakob

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AU - Stadlober, Barbara

AU - Kargl, Rupert

AU - Spirk, Stefan

AU - Grießer, Thomas

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