Avalanche: An end-to-end library for continual learning

V. Lomonaco, L. Pellegrini, A. Cossu, A. Carta, G. Graffieti, T.L. Hayes, M. De Lange, M. Masana, J. Pomponi, G.M. Van De Ven, M. Mundt, Q. She, K. Cooper, J. Forest, E. Belouadah, S. Calderara, G.I. Parisi, F. Cuzzolin, A.S. Tolias, S. ScardapaneL. Antiga, S. Ahmad, A. Popescu, C. Kanan, J. Van De Weijer, T. Tuytelaars, D. Bacciu, D. Maltoni

Publikation: Beitrag in Buch/Bericht/KonferenzbandBeitrag in einem KonferenzbandBegutachtung

Abstract

Learning continually from non-stationary data streams is a long-standing goal and a challenging problem in machine learning. Recently, we have witnessed a renewed and fast-growing interest in continual learning, especially within the deep learning community. However, algorithmic solutions are often difficult to re-implement, evaluate and port across different settings, where even results on standard benchmarks are hard to reproduce. In this work, we propose Avalanche, an open-source end-to-end library for continual learning research based on PyTorch. Avalanche is designed to provide a shared and collaborative codebase for fast prototyping, training, and reproducible evaluation of continual learning algorithms.
Originalspracheenglisch
TitelProceedings - 2021 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops, CVPRW 2021
Seiten3595-3605
Seitenumfang11
ISBN (elektronisch)9781665448994
DOIs
PublikationsstatusVeröffentlicht - 2021
Extern publiziertJa
Veranstaltung2021 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops: CVPRW 2021 - Virtuell, USA / Vereinigte Staaten
Dauer: 19 Juni 202125 Juni 2021

Konferenz

Konferenz2021 IEEE/CVF Conference on Computer Vision and Pattern Recognition Workshops
KurztitelCVPRW 2021
Land/GebietUSA / Vereinigte Staaten
OrtVirtuell
Zeitraum19/06/2125/06/21

ASJC Scopus subject areas

  • Elektrotechnik und Elektronik
  • Maschinelles Sehen und Mustererkennung

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