X-ray Lithography: fundamentals and applications

Massimo Tormen, Gianluca Grenci, Benedetta Marmiroli, Filippo Romanato

Research output: Chapter in Book/Report/Conference proceedingChapterResearch

Original languageEnglish
Title of host publicationNanolithography
Place of PublicationLondon (UK), Hoboken (USA)
PublisherISTE-Wiley
Pages1-325
Edition1
ISBN (Print)978-1-84821-211-4
Publication statusPublished - 2011

Fields of Expertise

  • Sonstiges

Treatment code (Nähere Zuordnung)

  • Application
  • Theoretical
  • Experimental
  • Review

Cite this

Tormen, M., Grenci, G., Marmiroli, B., & Romanato, F. (2011). X-ray Lithography: fundamentals and applications. In Nanolithography (1 ed., pp. 1-325). London (UK), Hoboken (USA): ISTE-Wiley.

X-ray Lithography: fundamentals and applications. / Tormen, Massimo; Grenci, Gianluca; Marmiroli, Benedetta; Romanato, Filippo.

Nanolithography. 1. ed. London (UK), Hoboken (USA) : ISTE-Wiley, 2011. p. 1-325.

Research output: Chapter in Book/Report/Conference proceedingChapterResearch

Tormen, M, Grenci, G, Marmiroli, B & Romanato, F 2011, X-ray Lithography: fundamentals and applications. in Nanolithography. 1 edn, ISTE-Wiley, London (UK), Hoboken (USA), pp. 1-325.
Tormen M, Grenci G, Marmiroli B, Romanato F. X-ray Lithography: fundamentals and applications. In Nanolithography. 1 ed. London (UK), Hoboken (USA): ISTE-Wiley. 2011. p. 1-325
Tormen, Massimo ; Grenci, Gianluca ; Marmiroli, Benedetta ; Romanato, Filippo. / X-ray Lithography: fundamentals and applications. Nanolithography. 1. ed. London (UK), Hoboken (USA) : ISTE-Wiley, 2011. pp. 1-325
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