Abstract
X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons. In this perspective article, we describe X-ray lithography’s latest advancements. First, we report the improvement in the fabrication of the high aspect ratio and high-resolution micro/nanostructures. Then, we present the radiation-assisted synthesis and processing of novel materials for the next generation of functional devices. We finally draw our conclusion on the future prospects of the technique.
| Original language | English |
|---|---|
| Article number | 835701 |
| Number of pages | 8 |
| Journal | Frontiers in Nanotechnology |
| Volume | 4 |
| DOIs | |
| Publication status | Published - 2022 |
Keywords
- X-ray lithography
- nanofabrication
- nanopatterning
- radiation assisted materials synthesis and processing
- x-ray lithography
- nanofabriaction
- x-ray interference lithography
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering
- Biomedical Engineering
- Computer Science Applications
Fields of Expertise
- Advanced Materials Science