Width determination of SiO2 films in Si-based devices using low-loss EFTEM: image contrast as a function of sample thickness

Bernhard Schaffer, Werner Grogger, Ferdinand Hofer

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)1-7
JournalMicron
Issue number34
Publication statusPublished - 2003

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Width determination of SiO2 films in Si-based devices using low-loss EFTEM: image contrast as a function of sample thickness. / Schaffer, Bernhard; Grogger, Werner; Hofer, Ferdinand.

In: Micron, No. 34, 2003, p. 1-7.

Research output: Contribution to journalArticleResearchpeer-review

@article{e1724474d9ca48e88529413f8dcdb879,
title = "Width determination of SiO2 films in Si-based devices using low-loss EFTEM: image contrast as a function of sample thickness",
author = "Bernhard Schaffer and Werner Grogger and Ferdinand Hofer",
year = "2003",
language = "English",
pages = "1--7",
journal = "Micron",
issn = "0968-4328",
publisher = "Elsevier Limited",
number = "34",

}

TY - JOUR

T1 - Width determination of SiO2 films in Si-based devices using low-loss EFTEM: image contrast as a function of sample thickness

AU - Schaffer, Bernhard

AU - Grogger, Werner

AU - Hofer, Ferdinand

PY - 2003

Y1 - 2003

M3 - Article

SP - 1

EP - 7

JO - Micron

JF - Micron

SN - 0968-4328

IS - 34

ER -