Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants

Murad Redzheb*, Oguzhan Orkut Okudur, Sigrid Bernstorff, Krunoslav Juraic, Pascal Van Der Voort, Silvia Armini

*Corresponding author for this work

Research output: Contribution to journalArticle

Abstract

Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation-induced self-assembly of 1,2-bis(triethoxysilyl)ethane and an ionic Gemini 16-12-16 surfactant under acidic conditions. The films were characterized by Fourier-transform infrared spectroscopy, grazing-incidence small-angle X-ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.

Original languageEnglish
Pages (from-to)2295-2298
Number of pages4
JournalChemPhysChem
Volume19
Issue number18
DOIs
Publication statusPublished - 18 Sep 2018

Keywords

  • Gemini surfactants
  • mesoporous materials
  • organosilica
  • self-assembly
  • thin films

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Physical and Theoretical Chemistry

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    Redzheb, M., Okudur, O. O., Bernstorff, S., Juraic, K., Van Der Voort, P., & Armini, S. (2018). Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. ChemPhysChem, 19(18), 2295-2298. https://doi.org/10.1002/cphc.201800341