Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants

Murad Redzheb, Oguzhan Orkut Okudur, Sigrid Bernstorff, Krunoslav Juraic, Pascal Van Der Voort, Silvia Armini

Research output: Contribution to journalArticleResearchpeer-review

Abstract

Periodic mesoporous organosilica (PMO) thin films were synthesized by evaporation-induced self-assembly of 1,2-bis(triethoxysilyl)ethane and an ionic Gemini 16-12-16 surfactant under acidic conditions. The films were characterized by Fourier-transform infrared spectroscopy, grazing-incidence small-angle X-ray scattering, ellipsometric porosimetry, impedance measurements, and nanoindentation. The ease of control of the packing parameter in Gemini surfactants makes the PMO film templated by a Gemini an exciting first step towards small pore size PMO films with engineered mesostructures.

Original languageEnglish
Pages (from-to)2295-2298
Number of pages4
JournalChemPhysChem
Volume19
Issue number18
DOIs
Publication statusPublished - 18 Sep 2018

Fingerprint

Surface-Active Agents
Tuning
surfactants
tuning
impedance measurement
Nanoindentation
nanoindentation
X ray scattering
grazing incidence
ethane
Self assembly
Pore size
self assembly
Evaporation
infrared spectroscopy
evaporation
porosity
Thin films
thin films
scattering

Keywords

  • Gemini surfactants
  • mesoporous materials
  • organosilica
  • self-assembly
  • thin films

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Physical and Theoretical Chemistry

Cite this

Redzheb, M., Okudur, O. O., Bernstorff, S., Juraic, K., Van Der Voort, P., & Armini, S. (2018). Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. ChemPhysChem, 19(18), 2295-2298. https://doi.org/10.1002/cphc.201800341

Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. / Redzheb, Murad; Okudur, Oguzhan Orkut; Bernstorff, Sigrid; Juraic, Krunoslav; Van Der Voort, Pascal; Armini, Silvia.

In: ChemPhysChem, Vol. 19, No. 18, 18.09.2018, p. 2295-2298.

Research output: Contribution to journalArticleResearchpeer-review

Redzheb, M, Okudur, OO, Bernstorff, S, Juraic, K, Van Der Voort, P & Armini, S 2018, 'Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants' ChemPhysChem, vol. 19, no. 18, pp. 2295-2298. https://doi.org/10.1002/cphc.201800341
Redzheb M, Okudur OO, Bernstorff S, Juraic K, Van Der Voort P, Armini S. Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. ChemPhysChem. 2018 Sep 18;19(18):2295-2298. https://doi.org/10.1002/cphc.201800341
Redzheb, Murad ; Okudur, Oguzhan Orkut ; Bernstorff, Sigrid ; Juraic, Krunoslav ; Van Der Voort, Pascal ; Armini, Silvia. / Tuning the Properties of Periodic Mesoporous Organosilica Films for Low-k Application by Gemini Surfactants. In: ChemPhysChem. 2018 ; Vol. 19, No. 18. pp. 2295-2298.
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