Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Luca Malfatti, Alessandra Pinna, Stefano Enzo, Paolo Falcaro, Benedetta Marmiroli, Plinio Innocenzi

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	165-171
Journal	Journal of Synchroton Radiation
Volume	22
DOIs	https://doi.org/10.1107/S1600577514024047
Publication status	Published - 2015

Fields of Expertise

@article{71eb09141213463c9b698bff87ba6093,

title = "Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing",

author = "Luca Malfatti and Alessandra Pinna and Stefano Enzo and Paolo Falcaro and Benedetta Marmiroli and Plinio Innocenzi",

year = "2015",

doi = "10.1107/S1600577514024047",

language = "English",

volume = "22",

pages = "165--171",

journal = "Journal of Synchroton Radiation",

issn = "1600-5775",

publisher = "International Union of Crystallography",

}

TY - JOUR

T1 - Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

AU - Malfatti, Luca

AU - Pinna, Alessandra

AU - Enzo, Stefano

AU - Falcaro, Paolo

AU - Marmiroli, Benedetta

AU - Innocenzi, Plinio

PY - 2015

Y1 - 2015

U2 - 10.1107/S1600577514024047

DO - 10.1107/S1600577514024047

M3 - Article

SN - 1600-5775

VL - 22

SP - 165

EP - 171

JO - Journal of Synchroton Radiation

JF - Journal of Synchroton Radiation

ER -