Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing

Luca Malfatti, Alessandra Pinna, Stefano Enzo, Paolo Falcaro, Benedetta Marmiroli, Plinio Innocenzi

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)165-171
JournalJournal of synchroton radiation
Volume22
DOIs
Publication statusPublished - 2015

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Experimental

Cite this

Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing. / Malfatti, Luca; Pinna, Alessandra; Enzo, Stefano; Falcaro, Paolo; Marmiroli, Benedetta; Innocenzi, Plinio.

In: Journal of synchroton radiation, Vol. 22, 2015, p. 165-171.

Research output: Contribution to journalArticleResearchpeer-review

Malfatti, Luca ; Pinna, Alessandra ; Enzo, Stefano ; Falcaro, Paolo ; Marmiroli, Benedetta ; Innocenzi, Plinio. / Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing. In: Journal of synchroton radiation. 2015 ; Vol. 22. pp. 165-171.
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AU - Marmiroli, Benedetta

AU - Innocenzi, Plinio

PY - 2015

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