Tris(trimethylsilyl)germane (Me3Si)3GeH: A Molecular Model for Sulfur Passivation of Ge(111) Surfaces,

Gilbert Okorn*, Roland Fischer, Beate Gabriele Steller, Philipp Engesser, Harald Okorn-Schmidt

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Tristrimethylsilylgermane, (Me3Si)3GeH, was employed as a molecular model compound for hydrogen terminated Ge(111) surfaces. Time and temperature dependent NMR spectroscopy yielded rate constants for the reaction between (Me3Si)3GeH and elemental sulfur and allowed for the determination of the activation energy for this molecular model reaction to mimic germanium surface passivation.
Original languageEnglish
Pages (from-to)36-40
Number of pages5
JournalSolid State Phenomena
Publication statusPublished - 2016


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