The Nanoscale Implications of a Molecular Gas Beam during Electron Beam Induced Deposition

Robert Winkler; Jason D. Fowlkes; Aleksandra Szkudlarek; Ivo Utke; Philip D. Rack; Harald Plank

doi:10.1021/am405591d

The Nanoscale Implications of a Molecular Gas Beam during Electron Beam Induced Deposition

Robert Winkler^*, Jason D. Fowlkes, Aleksandra Szkudlarek, Ivo Utke, Philip D. Rack, Harald Plank^*

^*Corresponding author for this work

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Abstract

The gas flux direction in focused electron beam induced processes can strongly destabilize the morphology on the nanometer scale. We demonstrate how pattern parameters such as position relative to the gas nozzle, axial rotation, scanning direction, and patterning sequence result in different growth modes for identical structures. This is mainly caused by nanoscale geometric shadowing, particularly when shadowing distances are comparable to surface diffusion lengths of (CH3)3-Pt-CpCH3 adsorbates. Furthermore, two different adsorbate replenishment mechanisms exist and are governed by either surface diffusion or directional gas flux adsorption. The experimental study is complemented by calculations and dynamic growth simulations which successfully emulate the observed morphology instabilities and support the proposed growth model

Original language	German
Pages (from-to)	2987-2995
Journal	ACS Applied Materials & Interfaces
Volume	6
Issue number	4
DOIs	https://doi.org/10.1021/am405591d
Publication status	Published - 2014

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1021/am405591d

Functional Nanofabrication
Dohr, J., Plank, H., Rosker, S., Winkler, R., Stermitz, M., Reisecker, V., Michelitsch, S. G. W., Brugger-Hatzl, M., Schmied, R., Eicher, B., Orthacker, A., Arnold, G., Sattelkow, J., Kolb, F., Ganner, T., Haselmann, U., Seewald, L. & Aschl, T.
1/01/09 → 31/12/23
Project: Research project

Cite this

@article{969f754c7e04438c94014575d4ce58f9,

title = "The Nanoscale Implications of a Molecular Gas Beam during Electron Beam Induced Deposition",

abstract = "The gas flux direction in focused electron beam induced processes can strongly destabilize the morphology on the nanometer scale. We demonstrate how pattern parameters such as position relative to the gas nozzle, axial rotation, scanning direction, and patterning sequence result in different growth modes for identical structures. This is mainly caused by nanoscale geometric shadowing, particularly when shadowing distances are comparable to surface diffusion lengths of (CH3)3-Pt-CpCH3 adsorbates. Furthermore, two different adsorbate replenishment mechanisms exist and are governed by either surface diffusion or directional gas flux adsorption. The experimental study is complemented by calculations and dynamic growth simulations which successfully emulate the observed morphology instabilities and support the proposed growth model",

author = "Robert Winkler and Fowlkes, {Jason D.} and Aleksandra Szkudlarek and Ivo Utke and Rack, {Philip D.} and Harald Plank",

year = "2014",

doi = "10.1021/am405591d",

language = "deutsch",

volume = "6",

pages = "2987--2995",

journal = "ACS Applied Materials & Interfaces",

issn = "1944-8252 ",

publisher = "American Chemical Society",

number = "4",

}

TY - JOUR

T1 - The Nanoscale Implications of a Molecular Gas Beam during Electron Beam Induced Deposition

AU - Winkler, Robert

AU - Fowlkes, Jason D.

AU - Szkudlarek, Aleksandra

AU - Utke, Ivo

AU - Rack, Philip D.

AU - Plank, Harald

PY - 2014

Y1 - 2014

N2 - The gas flux direction in focused electron beam induced processes can strongly destabilize the morphology on the nanometer scale. We demonstrate how pattern parameters such as position relative to the gas nozzle, axial rotation, scanning direction, and patterning sequence result in different growth modes for identical structures. This is mainly caused by nanoscale geometric shadowing, particularly when shadowing distances are comparable to surface diffusion lengths of (CH3)3-Pt-CpCH3 adsorbates. Furthermore, two different adsorbate replenishment mechanisms exist and are governed by either surface diffusion or directional gas flux adsorption. The experimental study is complemented by calculations and dynamic growth simulations which successfully emulate the observed morphology instabilities and support the proposed growth model

AB - The gas flux direction in focused electron beam induced processes can strongly destabilize the morphology on the nanometer scale. We demonstrate how pattern parameters such as position relative to the gas nozzle, axial rotation, scanning direction, and patterning sequence result in different growth modes for identical structures. This is mainly caused by nanoscale geometric shadowing, particularly when shadowing distances are comparable to surface diffusion lengths of (CH3)3-Pt-CpCH3 adsorbates. Furthermore, two different adsorbate replenishment mechanisms exist and are governed by either surface diffusion or directional gas flux adsorption. The experimental study is complemented by calculations and dynamic growth simulations which successfully emulate the observed morphology instabilities and support the proposed growth model

U2 - 10.1021/am405591d

DO - 10.1021/am405591d

M3 - Artikel

SN - 1944-8252

VL - 6

SP - 2987

EP - 2995

JO - ACS Applied Materials & Interfaces

JF - ACS Applied Materials & Interfaces

IS - 4

ER -

The Nanoscale Implications of a Molecular Gas Beam during Electron Beam Induced Deposition

Abstract

Fields of Expertise

Treatment code (Nähere Zuordnung)

Access to Document

Projects

Functional Nanofabrication

Cite this