The formation of silicon carbide films from disilane derivatives

Edwin Hengge, Arno Zechmann, Ferdinand Hofer, Peter Pölt, Benno Lux

Research output: Contribution to journal › Article › peer-review

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@article{87dc49c9e88f4e6688140e68230abe31,

title = "The formation of silicon carbide films from disilane derivatives",

author = "Edwin Hengge and Arno Zechmann and Ferdinand Hofer and Peter P{\"o}lt and Benno Lux",

year = "1994",

language = "English",

volume = "6",

pages = "584--587",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH ",

}