The formation of silicon carbide films from disilane derivatives

Edwin Hengge, Arno Zechmann, Ferdinand Hofer, Peter Pölt, Benno Lux

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)584-587
JournalAdvanced Materials
Volume6
Publication statusPublished - 1994

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

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