TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization

Werner Grogger, Christian Gspan, Bernhard Schaffer, Martina Dienstleder, Michael Rogers, Albert Brunegger, Ferdinand Hofer

Research output: Contribution to conference(Old data) Lecture or PresentationResearch

Original languageEnglish
Publication statusPublished - 15 Sep 2005
EventCrystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV - Grenoble
Duration: 15 Sep 200516 Sep 2005

Conference

ConferenceCrystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV
CityGrenoble
Period15/09/0516/09/05

Cite this

Grogger, W., Gspan, C., Schaffer, B., Dienstleder, M., Rogers, M., Brunegger, A., & Hofer, F. (2005). TEM, EELS, and EFTEM: Application to Semiconductor Materials and Device Characterization. Crystalline Defects and Contamination: Their impact and Control in Device Manufacturing IV, Grenoble, .