Sliding Mode Control of a Distributed-Parameter Wafer Spin Clean Process

Stefan Koch; Martin Kleindienst; Jaime A. Moreno; Martin Horn

doi:10.1109/TCST.2020.3028936

Sliding Mode Control of a Distributed-Parameter Wafer Spin Clean Process

Stefan Koch, Martin Kleindienst, Jaime A. Moreno, Martin Horn

Institute of Automation and Control (4430)

Research output: Contribution to journal › Article › peer-review

Abstract

In this study, a temperature controller for chemical fluids, which are impinged on a rotating silicon wafer, is presented. The chemical fluid is heated by a heating plate that is mounted below the rotating wafer. The thermal behavior of the system is modeled as a distributed-parameter system. In order to deal with this problem setting, a second-order sliding mode controller is proposed. The controller is inspired by the finite-dimensional generalized super-twisting algorithm. Finite-time convergence despite the presence of a certain class of disturbances is proven by means of a Lyapunov function. The algorithm is implemented and tested on the real system.

Original language	English
Journal	IEEE Transactions on Control Systems Technology
DOIs	https://doi.org/10.1109/TCST.2020.3028936
Publication status	E-pub ahead of print - 21 Oct 2020

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10.1109/TCST.2020.3028936

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@article{0df4b60770c744c784d74b171b3f678f,

title = "Sliding Mode Control of a Distributed-Parameter Wafer Spin Clean Process",

abstract = "In this study, a temperature controller for chemical fluids, which are impinged on a rotating silicon wafer, is presented. The chemical fluid is heated by a heating plate that is mounted below the rotating wafer. The thermal behavior of the system is modeled as a distributed-parameter system. In order to deal with this problem setting, a second-order sliding mode controller is proposed. The controller is inspired by the finite-dimensional generalized super-twisting algorithm. Finite-time convergence despite the presence of a certain class of disturbances is proven by means of a Lyapunov function. The algorithm is implemented and tested on the real system.",

author = "Stefan Koch and Martin Kleindienst and Moreno, {Jaime A.} and Martin Horn",

year = "2020",

month = oct,

day = "21",

doi = "10.1109/TCST.2020.3028936",

language = "English",

journal = "IEEE Transactions on Control Systems Technology",

issn = "1063-6536",

publisher = "Institute of Electrical and Electronics Engineers",

}

TY - JOUR

T1 - Sliding Mode Control of a Distributed-Parameter Wafer Spin Clean Process

AU - Koch, Stefan

AU - Kleindienst, Martin

AU - Moreno, Jaime A.

AU - Horn, Martin

PY - 2020/10/21

Y1 - 2020/10/21

N2 - In this study, a temperature controller for chemical fluids, which are impinged on a rotating silicon wafer, is presented. The chemical fluid is heated by a heating plate that is mounted below the rotating wafer. The thermal behavior of the system is modeled as a distributed-parameter system. In order to deal with this problem setting, a second-order sliding mode controller is proposed. The controller is inspired by the finite-dimensional generalized super-twisting algorithm. Finite-time convergence despite the presence of a certain class of disturbances is proven by means of a Lyapunov function. The algorithm is implemented and tested on the real system.

AB - In this study, a temperature controller for chemical fluids, which are impinged on a rotating silicon wafer, is presented. The chemical fluid is heated by a heating plate that is mounted below the rotating wafer. The thermal behavior of the system is modeled as a distributed-parameter system. In order to deal with this problem setting, a second-order sliding mode controller is proposed. The controller is inspired by the finite-dimensional generalized super-twisting algorithm. Finite-time convergence despite the presence of a certain class of disturbances is proven by means of a Lyapunov function. The algorithm is implemented and tested on the real system.

U2 - 10.1109/TCST.2020.3028936

DO - 10.1109/TCST.2020.3028936

M3 - Article

JO - IEEE Transactions on Control Systems Technology

JF - IEEE Transactions on Control Systems Technology

SN - 1063-6536

ER -

Sliding Mode Control of a Distributed-Parameter Wafer Spin Clean Process

Abstract

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