SIMS Characterisation of Chemical Solution Deposited Thin Film Systems of BaTiO3/X (X = LaNiO3, La0,5Sr0,5CoO3, La0,7Sr0,3MnO3) on a Platinized Silicon Wafer

Anton Busic, Klaus Reichmann, Herbert Hutter, Christoph Pollak

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)218-223
JournalThin solid films
Volume405
Publication statusPublished - 2002

Treatment code (Nähere Zuordnung)

  • Application

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