Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

Stefan Krivec; Nadezda Matsko; V. Satzinger; Niklas Pucher; Nicole Galler; Thomas Koch; V. Schmidt; Werner Grogger; R. Liska; H. Lichtenegger

doi:10.1002/adfm.200901790

Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

Stefan Krivec, Nadezda Matsko, V. Satzinger, Niklas Pucher, Nicole Galler, Thomas Koch, V. Schmidt, Werner Grogger, R. Liska, H. Lichtenegger

Institute of Electron Microscopy and Nanoanalysis (5190)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	811-819
Journal	Advanced Functional Materials
Volume	20
Issue number	5
DOIs	https://doi.org/10.1002/adfm.200901790
Publication status	Published - 2010

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1002/adfm.200901790

Nanoimprint Lithography in Austria
Haber, T. & Grogger, W.
1/01/09 → 31/03/14
Project: Research project

Cite this

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title = "Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization",

author = "Stefan Krivec and Nadezda Matsko and V. Satzinger and Niklas Pucher and Nicole Galler and Thomas Koch and V. Schmidt and Werner Grogger and R. Liska and H. Lichtenegger",

note = "online",

year = "2010",

doi = "10.1002/adfm.200901790",

language = "English",

volume = "20",

pages = "811--819",

journal = "Advanced Functional Materials",

issn = "1616-3028",

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TY - JOUR

T1 - Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

AU - Krivec, Stefan

AU - Matsko, Nadezda

AU - Satzinger, V.

AU - Pucher, Niklas

AU - Galler, Nicole

AU - Koch, Thomas

AU - Schmidt, V.

AU - Grogger, Werner

AU - Liska, R.

AU - Lichtenegger, H.

N1 - online

PY - 2010

Y1 - 2010

U2 - 10.1002/adfm.200901790

DO - 10.1002/adfm.200901790

M3 - Article

SN - 1616-3028

VL - 20

SP - 811

EP - 819

JO - Advanced Functional Materials

JF - Advanced Functional Materials

IS - 5

ER -

Silica-Based, Organically Modified Host Material for Waveguide Structuring by Two-Photon-Induced Photopolymerization

Treatment code (Nähere Zuordnung)

Access to Document

Projects

Nanoimprint Lithography in Austria

Cite this