Rapid and Highly Compact Purification for Focused Electron Beam Induced Deposits: A Low Temperature Approach Using Electron Stimulated H2O Reactions

Focused electron beam induced deposition (FEBID) is an important synthesis method as it is an extremely flexible tool for fabricating functional (3D) structures with nanometer spatial resolution. However, FEBID has historically suffered from carbon impurities up to 90 at %, which significantly limits the intended functionalities. In this study we demonstrate that MeCpPtIVMe3 deposits can be fully purified by an electron-beam assisted approach using H2O vapor at room temperature, which eliminates sample and/or gas heating and complicated gas delivery systems, respectively. We demonstrate that local pressures of 10 Pa results in an electron-limited regime, thus enabling high purification rates of better than 5 min·nA–1·μm–2 (30 C·cm–2) for initially 150 nm thick deposits. Furthermore, TEM measurements suggest the purification process for the highly compact deposits occurs via a bottom-up process.