Plasma oxidation as a tool to design oxide films at low temperatures

Robert Schennach, D.G. Naugle, H McWhinney, David L Cocke

Research output: Contribution to conference(Old data) Lecture or Presentation

Original languageEnglish
Publication statusPublished - 2 Oct 2000
Event47th International Symposium of the American Vacuum Society - Boston, MA, United States
Duration: 2 Oct 20006 Oct 2000

Conference

Conference47th International Symposium of the American Vacuum Society
CountryUnited States
CityBoston, MA
Period2/10/006/10/00

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Schennach, R., Naugle, D. G., McWhinney, H., & Cocke, D. L. (2000). Plasma oxidation as a tool to design oxide films at low temperatures. 47th International Symposium of the American Vacuum Society, Boston, MA, United States.