Plasma oxidation as a tool to design oxide films at low temperatures

Robert Schennach, D.G. Naugle, H McWhinney, David L Cocke

Research output: Contribution to conference(Old data) Lecture or PresentationResearch

Original languageEnglish
Publication statusPublished - 2 Oct 2000
Event47th International Symposium of the American Vacuum Society - Boston, MA, United States
Duration: 2 Oct 20006 Oct 2000

Conference

Conference47th International Symposium of the American Vacuum Society
CountryUnited States
CityBoston, MA
Period2/10/006/10/00

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Schennach, R., Naugle, D. G., McWhinney, H., & Cocke, D. L. (2000). Plasma oxidation as a tool to design oxide films at low temperatures. 47th International Symposium of the American Vacuum Society, Boston, MA, United States.

Plasma oxidation as a tool to design oxide films at low temperatures. / Schennach, Robert; Naugle, D.G.; McWhinney, H; Cocke, David L.

2000. 47th International Symposium of the American Vacuum Society, Boston, MA, United States.

Research output: Contribution to conference(Old data) Lecture or PresentationResearch

Schennach, R, Naugle, DG, McWhinney, H & Cocke, DL 2000, 'Plasma oxidation as a tool to design oxide films at low temperatures' 47th International Symposium of the American Vacuum Society, Boston, MA, United States, 2/10/00 - 6/10/00, .
Schennach R, Naugle DG, McWhinney H, Cocke DL. Plasma oxidation as a tool to design oxide films at low temperatures. 2000. 47th International Symposium of the American Vacuum Society, Boston, MA, United States.
Schennach, Robert ; Naugle, D.G. ; McWhinney, H ; Cocke, David L. / Plasma oxidation as a tool to design oxide films at low temperatures. 47th International Symposium of the American Vacuum Society, Boston, MA, United States.
@conference{7ca6688b43f24e67886331401db80176,
title = "Plasma oxidation as a tool to design oxide films at low temperatures",
author = "Robert Schennach and D.G. Naugle and H McWhinney and Cocke, {David L}",
year = "2000",
month = "10",
day = "2",
language = "English",
note = "47th International Symposium of the American Vacuum Society ; Conference date: 02-10-2000 Through 06-10-2000",

}

TY - CONF

T1 - Plasma oxidation as a tool to design oxide films at low temperatures

AU - Schennach, Robert

AU - Naugle, D.G.

AU - McWhinney, H

AU - Cocke, David L

PY - 2000/10/2

Y1 - 2000/10/2

M3 - (Old data) Lecture or Presentation

ER -