Plasma oxidation as a tool to design oxide films at low temperatures

Robert Schennach, T Grady, D.G. Naugle, J R Parga, H McWhinney, David L Cocke

Research output: Contribution to journal › Article

Original language	English
Pages (from-to)	1965-1970
Journal	Journal of vacuum science & technology / A
Volume	19
Issue number	4
DOIs	https://doi.org/10.1116/1.1380718
Publication status	Published - 2001

Treatment code (Nähere Zuordnung)

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author = "Robert Schennach and T Grady and D.G. Naugle and Parga, {J R} and H McWhinney and Cocke, {David L}",

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T1 - Plasma oxidation as a tool to design oxide films at low temperatures

AU - Schennach, Robert

AU - Grady, T

AU - Naugle, D.G.

AU - Parga, J R

AU - McWhinney, H

AU - Cocke, David L

PY - 2001

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JO - Journal of vacuum science & technology / A

JF - Journal of vacuum science & technology / A

SN - 0734-2101

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