| Original language | English |
|---|---|
| Pages (from-to) | 1965-1970 |
| Journal | Journal of vacuum science & technology / A |
| Volume | 19 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2001 |
Treatment code (Nähere Zuordnung)
- Basic - Fundamental (Grundlagenforschung)
Cite this
Schennach, R., Grady, T., Naugle, D. G., Parga, J. R., McWhinney, H., & Cocke, D. L. (2001). Plasma oxidation as a tool to design oxide films at low temperatures. Journal of vacuum science & technology / A, 19(4), 1965-1970. https://doi.org/10.1116/1.1380718
Plasma oxidation as a tool to design oxide films at low temperatures. / Schennach, Robert; Grady, T; Naugle, D.G.; Parga, J R; McWhinney, H; Cocke, David L.
In: Journal of vacuum science & technology / A, Vol. 19, No. 4, 2001, p. 1965-1970.Research output: Contribution to journal › Article › Research › peer-review
Schennach, R, Grady, T, Naugle, DG, Parga, JR, McWhinney, H & Cocke, DL 2001, 'Plasma oxidation as a tool to design oxide films at low temperatures' Journal of vacuum science & technology / A, vol. 19, no. 4, pp. 1965-1970. https://doi.org/10.1116/1.1380718
Schennach R, Grady T, Naugle DG, Parga JR, McWhinney H, Cocke DL. Plasma oxidation as a tool to design oxide films at low temperatures. Journal of vacuum science & technology / A. 2001;19(4):1965-1970. https://doi.org/10.1116/1.1380718
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AU - McWhinney, H
AU - Cocke, David L
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