Plasma oxidation as a tool to design oxide films at low temperatures

Robert Schennach, T Grady, D.G. Naugle, J R Parga, H McWhinney, David L Cocke

Research output: Contribution to journalArticlepeer-review

Original languageEnglish
Pages (from-to)1965-1970
JournalJournal of Vacuum Science and Technology / A
Volume19
Issue number4
DOIs
Publication statusPublished - 2001

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

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