Plasma oxidation as a tool to design oxide films at low temperatures

Robert Schennach, T Grady, D.G. Naugle, J R Parga, H McWhinney, David L Cocke

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)1965-1970
JournalJournal of vacuum science & technology / A
Volume19
Issue number4
DOIs
Publication statusPublished - 2001

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Plasma oxidation as a tool to design oxide films at low temperatures. / Schennach, Robert; Grady, T; Naugle, D.G.; Parga, J R; McWhinney, H; Cocke, David L.

In: Journal of vacuum science & technology / A, Vol. 19, No. 4, 2001, p. 1965-1970.

Research output: Contribution to journalArticleResearchpeer-review

Schennach, Robert ; Grady, T ; Naugle, D.G. ; Parga, J R ; McWhinney, H ; Cocke, David L. / Plasma oxidation as a tool to design oxide films at low temperatures. In: Journal of vacuum science & technology / A. 2001 ; Vol. 19, No. 4. pp. 1965-1970.
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