Photoresists based on coconut and castor oil

Klaus Peter Luef, Charlotte Petit, Bruno Grassl, Franz Stelzer, Stephanie Reynaud, Frank Wiesbrock

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)POLY-76
Number of pages1
JournalAbstracts of papers / American Chemical Society
Volume252nd ACS National Meeting & Exposition, Philadelphia, PA, United States, August 21-25, 2016
Publication statusPublished - 2016

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Application


  • NAWI Graz

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