Photoresists based on coconut and castor oil

Klaus Peter Luef, Charlotte Petit, Bruno Grassl, Franz Stelzer, Stephanie Reynaud, Frank Wiesbrock

Research output: Contribution to journalArticleResearch

Original languageEnglish
Pages (from-to)POLY-76
Number of pages1
JournalAbstracts of papers / American Chemical Society
Volume252nd ACS National Meeting & Exposition, Philadelphia, PA, United States, August 21-25, 2016
Publication statusPublished - 2016

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Application

Cooperations

  • NAWI Graz

Cite this

Luef, K. P., Petit, C., Grassl, B., Stelzer, F., Reynaud, S., & Wiesbrock, F. (2016). Photoresists based on coconut and castor oil. Abstracts of papers / American Chemical Society, 252nd ACS National Meeting & Exposition, Philadelphia, PA, United States, August 21-25, 2016, POLY-76.