Photoresists Based on Coconut and Castor Oil

Klaus Peter Luef, Charlotte Petit, Bruno Grassl, Stéphanie Reynaud, Frank Wiesbrock

Research output: Contribution to conference(Old data) Lecture or PresentationResearch

Original languageEnglish
Publication statusPublished - 21 Aug 2016
Event252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia - Philadelphia, United States
Duration: 21 Aug 201625 Aug 2016

Conference

Conference252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia
CountryUnited States
CityPhiladelphia
Period21/08/1625/08/16

Fields of Expertise

  • Advanced Materials Science

Cooperations

  • NAWI Graz

Cite this

Luef, K. P., Petit, C., Grassl, B., Reynaud, S., & Wiesbrock, F. (2016). Photoresists Based on Coconut and Castor Oil. 252nd American Chemical Society National Meeting & Exposition: Fall Meeting 2016 in Philadelphia, Philadelphia, United States.