Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Thomas Höfler; Anna Maria Track; Peter Pacher; Quan Shen; Heinz-Georg Flesch; G. Hlawacek; Georg Koller; Michael G. Ramsey; Robert Schennach; Roland Resel; Christian Teichert; Wolfgang Kern; Gregor Trimmel; Thomas Grießer

doi:10.1016/j.matchemphys.2009.08.065

Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Thomas Höfler, Anna Maria Track, Peter Pacher, Quan Shen, Heinz-Georg Flesch, G. Hlawacek, Georg Koller, Michael G. Ramsey, Robert Schennach, Roland Resel, Christian Teichert, Wolfgang Kern, Gregor Trimmel, Thomas Grießer

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	287-293
Journal	Materials Chemistry and Physics
Volume	119
Issue number	1-2
DOIs	https://doi.org/10.1016/j.matchemphys.2009.08.065
Publication status	Published - 2010

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10.1016/j.matchemphys.2009.08.065

Cite this

Höfler, T., Track, A. M., Pacher, P., Shen, Q., Flesch, H-G., Hlawacek, G., Koller, G., Ramsey, M. G., Schennach, R., Resel, R., Teichert, C., Kern, W., Trimmel, G., & Grießer, T. (2010). Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. Materials Chemistry and Physics, 119(1-2), 287-293. https://doi.org/10.1016/j.matchemphys.2009.08.065

Höfler, T, Track, AM, Pacher, P, Shen, Q, Flesch, H-G, Hlawacek, G, Koller, G, Ramsey, MG, Schennach, R , Resel, R, Teichert, C, Kern, W, Trimmel, G & Grießer, T 2010, 'Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification', Materials Chemistry and Physics, vol. 119, no. 1-2, pp. 287-293. https://doi.org/10.1016/j.matchemphys.2009.08.065

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title = "Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification",

author = "Thomas H{\"o}fler and Track, {Anna Maria} and Peter Pacher and Quan Shen and Heinz-Georg Flesch and G. Hlawacek and Georg Koller and Ramsey, {Michael G.} and Robert Schennach and Roland Resel and Christian Teichert and Wolfgang Kern and Gregor Trimmel and Thomas Grie{\ss}er",

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T1 - Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

AU - Höfler, Thomas

AU - Track, Anna Maria

AU - Pacher, Peter

AU - Shen, Quan

AU - Flesch, Heinz-Georg

AU - Hlawacek, G.

AU - Koller, Georg

AU - Ramsey, Michael G.

AU - Schennach, Robert

AU - Resel, Roland

AU - Teichert, Christian

AU - Kern, Wolfgang

AU - Trimmel, Gregor

AU - Grießer, Thomas

PY - 2010

Y1 - 2010

U2 - 10.1016/j.matchemphys.2009.08.065

DO - 10.1016/j.matchemphys.2009.08.065

M3 - Article

SN - 1879-3312

VL - 119

SP - 287

EP - 293

JO - Materials Chemistry and Physics

JF - Materials Chemistry and Physics

IS - 1-2

ER -