Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Thomas Höfler, Anna Maria Track, Peter Pacher, Quan Shen, Heinz-Georg Flesch, G. Hlawacek, Georg Koller, Michael G. Ramsey, Robert Schennach, Roland Resel, Christian Teichert, Wolfgang Kern, Gregor Trimmel, Thomas Grießer

Research output: Contribution to journalArticle

Original languageEnglish
Pages (from-to)287-293
JournalMaterials Chemistry and Physics
Volume119
Issue number1-2
DOIs
Publication statusPublished - 2010

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