Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions

Thomas Grießer, Thomas Höfler, Susanne Temmel, Wolfgang Kern, Gregor Trimmel

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)3011-3017
JournalChemistry of Materials
Volume19
Publication statusPublished - 2007

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