Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions

Thomas Grießer, Thomas Höfler, Susanne Temmel, Wolfgang Kern, Gregor Trimmel

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)3011-3017
JournalChemistry of Materials
Volume19
Publication statusPublished - 2007

Cite this

Photolithographic Patterning of Polymer Surfaces Using the Photo-Fries Rearrangement: Selective Postexposure Reactions. / Grießer, Thomas; Höfler, Thomas; Temmel, Susanne; Kern, Wolfgang; Trimmel, Gregor.

In: Chemistry of Materials, Vol. 19, 2007, p. 3011-3017.

Research output: Contribution to journalArticleResearchpeer-review

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AU - Temmel, Susanne

AU - Kern, Wolfgang

AU - Trimmel, Gregor

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