Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions

Thomas Grießer, Thomas Höfler, Susanne Temmel, Wolfgang Kern, Gregor Trimmel

Research output: Contribution to conferencePosterResearch

Original languageEnglish
Publication statusPublished - 2007
EventWinterschool on Organic Electronics - Planneralm, Donnersbach, Austria
Duration: 27 Jan 20072 Feb 2007

Conference

ConferenceWinterschool on Organic Electronics
CityPlanneralm, Donnersbach, Austria
Period27/01/072/02/07

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Grießer, T., Höfler, T., Temmel, S., Kern, W., & Trimmel, G. (2007). Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions. Poster session presented at Winterschool on Organic Electronics, Planneralm, Donnersbach, Austria, .