Patterning techniques for mesostructured films

Plinio Innocenzi, Tongjit Kidchob, Paolo Falcaro, Masahide Takahashi

Research output: Contribution to journalArticleResearchpeer-review

Abstract

Patterning mesostructured films is becoming an important area of research for its technological implications. Self-assembled mesoporous materials synthesized through templating of nano-objects offer, in fact, the possibility of hosting active organic molecules or nanoparticles, and several applications in photonics and microelectronics are now emerging. At the same time, new "unconventional" lithographic techniques are also available to design nano- or microscale patterned mesoporous structures. We discuss the recent developments of lithographic methods for patterning mesoporous materials; some applications and future trends are also envisaged in the present review.

Original languageEnglish
Pages (from-to)607-614
Number of pages8
JournalChemistry of Materials
Volume20
Issue number3
DOIs
Publication statusPublished - 12 Feb 2008
Externally publishedYes

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Mesoporous materials
Microelectronics
Photonics
Nanoparticles
Molecules

ASJC Scopus subject areas

  • Materials Chemistry
  • Materials Science(all)

Cite this

Patterning techniques for mesostructured films. / Innocenzi, Plinio; Kidchob, Tongjit; Falcaro, Paolo; Takahashi, Masahide.

In: Chemistry of Materials, Vol. 20, No. 3, 12.02.2008, p. 607-614.

Research output: Contribution to journalArticleResearchpeer-review

Innocenzi, P, Kidchob, T, Falcaro, P & Takahashi, M 2008, 'Patterning techniques for mesostructured films' Chemistry of Materials, vol. 20, no. 3, pp. 607-614. https://doi.org/10.1021/cm071784j
Innocenzi, Plinio ; Kidchob, Tongjit ; Falcaro, Paolo ; Takahashi, Masahide. / Patterning techniques for mesostructured films. In: Chemistry of Materials. 2008 ; Vol. 20, No. 3. pp. 607-614.
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