Patterning a cellulose based dual-tone photoresist via deep X-ray lithography

Miltscho Andreev, Benedetta Marmiroli^*, Robert Schennach, Heinz Amenitsch^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

1 results

Finished
Porous Materials @ Work
Klimant, I., Nidetzky, B., Coclite, A. M., Schennach, R., Sonderegger, B., Resel, R., Würschum, R., Amenitsch, H., Zojer, E., Bergmann, A., Falcaro, P., Borisov, S., Trimmel, G. & Slugovc, C.
1/07/18 → 31/03/22
Project: Research project