Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study

Research output: Contribution to journalArticleResearchpeer-review

Abstract

Properties and performance of materials are closely connected. In order to obtain piezoelectric and lasing optical quality, ZnO has to be free of defects and highly crystalline. Instead, conductivity depends upon such defects, making it not trivial to aim at a specific set of properties in a single step. In this regard, we studied in situ the effect of temperature as an additional knob to finely control such properties. In this contribution, plasma enhanced atomic layer deposited (PE-ALD) zinc oxide (ZnO) layers, deposited between 25 °C and 250 °C, were studied in situ during annealing in air, and the opto-chemical and structural characteristics of the oxides were followed as a function of temperature. In situ spectroscopic ellipsometry (SE) and X-ray diffraction (XRD) were adopted to identify temperature windows where major structural and optical changes in the material occurred. Two temperature regions were identified for the effusion of adsorbed gases and minor structural rearrangements (180–280 °C) and for the growth/coalescence of ZnO crystals and its densification (360–500 °C). The results were corroborated by ex situ SE, XRD, UV–Vis and X-ray photoelectron spectroscopy. The in situ study revealed differences among the ZnO layers deposited at different temperatures, giving additional insights on the material properties deposited by PE-ALD.

Original languageEnglish
Pages (from-to)10-18
Number of pages9
JournalApplied Surface Science
Volume483
DOIs
Publication statusPublished - 31 Jul 2019

Fingerprint

Zinc Oxide
Zinc oxide
zinc oxides
Heat treatment
Plasmas
Spectroscopic ellipsometry
ellipsometry
Temperature
temperature
knobs
Knobs
X ray diffraction
Defects
x rays
defects
densification
Coalescence
Densification
diffraction
Oxides

Keywords

  • Annealing
  • Atomic layer deposition
  • Electro-optical materials
  • Plasma
  • Thin films
  • Zinc oxide

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO : An in situ study. / Perrotta, Alberto; Pilz, Julian; Milella, Antonella; Coclite, Anna Maria.

In: Applied Surface Science, Vol. 483, 31.07.2019, p. 10-18.

Research output: Contribution to journalArticleResearchpeer-review

@article{e9baff3d1cad40adb30b638ad6222ff2,
title = "Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO: An in situ study",
abstract = "Properties and performance of materials are closely connected. In order to obtain piezoelectric and lasing optical quality, ZnO has to be free of defects and highly crystalline. Instead, conductivity depends upon such defects, making it not trivial to aim at a specific set of properties in a single step. In this regard, we studied in situ the effect of temperature as an additional knob to finely control such properties. In this contribution, plasma enhanced atomic layer deposited (PE-ALD) zinc oxide (ZnO) layers, deposited between 25 °C and 250 °C, were studied in situ during annealing in air, and the opto-chemical and structural characteristics of the oxides were followed as a function of temperature. In situ spectroscopic ellipsometry (SE) and X-ray diffraction (XRD) were adopted to identify temperature windows where major structural and optical changes in the material occurred. Two temperature regions were identified for the effusion of adsorbed gases and minor structural rearrangements (180–280 °C) and for the growth/coalescence of ZnO crystals and its densification (360–500 °C). The results were corroborated by ex situ SE, XRD, UV–Vis and X-ray photoelectron spectroscopy. The in situ study revealed differences among the ZnO layers deposited at different temperatures, giving additional insights on the material properties deposited by PE-ALD.",
keywords = "Annealing, Atomic layer deposition, Electro-optical materials, Plasma, Thin films, Zinc oxide",
author = "Alberto Perrotta and Julian Pilz and Antonella Milella and Coclite, {Anna Maria}",
year = "2019",
month = "7",
day = "31",
doi = "10.1016/j.apsusc.2019.03.122",
language = "English",
volume = "483",
pages = "10--18",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Opto-chemical control through thermal treatment of plasma enhanced atomic layer deposited ZnO

T2 - An in situ study

AU - Perrotta, Alberto

AU - Pilz, Julian

AU - Milella, Antonella

AU - Coclite, Anna Maria

PY - 2019/7/31

Y1 - 2019/7/31

N2 - Properties and performance of materials are closely connected. In order to obtain piezoelectric and lasing optical quality, ZnO has to be free of defects and highly crystalline. Instead, conductivity depends upon such defects, making it not trivial to aim at a specific set of properties in a single step. In this regard, we studied in situ the effect of temperature as an additional knob to finely control such properties. In this contribution, plasma enhanced atomic layer deposited (PE-ALD) zinc oxide (ZnO) layers, deposited between 25 °C and 250 °C, were studied in situ during annealing in air, and the opto-chemical and structural characteristics of the oxides were followed as a function of temperature. In situ spectroscopic ellipsometry (SE) and X-ray diffraction (XRD) were adopted to identify temperature windows where major structural and optical changes in the material occurred. Two temperature regions were identified for the effusion of adsorbed gases and minor structural rearrangements (180–280 °C) and for the growth/coalescence of ZnO crystals and its densification (360–500 °C). The results were corroborated by ex situ SE, XRD, UV–Vis and X-ray photoelectron spectroscopy. The in situ study revealed differences among the ZnO layers deposited at different temperatures, giving additional insights on the material properties deposited by PE-ALD.

AB - Properties and performance of materials are closely connected. In order to obtain piezoelectric and lasing optical quality, ZnO has to be free of defects and highly crystalline. Instead, conductivity depends upon such defects, making it not trivial to aim at a specific set of properties in a single step. In this regard, we studied in situ the effect of temperature as an additional knob to finely control such properties. In this contribution, plasma enhanced atomic layer deposited (PE-ALD) zinc oxide (ZnO) layers, deposited between 25 °C and 250 °C, were studied in situ during annealing in air, and the opto-chemical and structural characteristics of the oxides were followed as a function of temperature. In situ spectroscopic ellipsometry (SE) and X-ray diffraction (XRD) were adopted to identify temperature windows where major structural and optical changes in the material occurred. Two temperature regions were identified for the effusion of adsorbed gases and minor structural rearrangements (180–280 °C) and for the growth/coalescence of ZnO crystals and its densification (360–500 °C). The results were corroborated by ex situ SE, XRD, UV–Vis and X-ray photoelectron spectroscopy. The in situ study revealed differences among the ZnO layers deposited at different temperatures, giving additional insights on the material properties deposited by PE-ALD.

KW - Annealing

KW - Atomic layer deposition

KW - Electro-optical materials

KW - Plasma

KW - Thin films

KW - Zinc oxide

UR - http://www.scopus.com/inward/record.url?scp=85063544853&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2019.03.122

DO - 10.1016/j.apsusc.2019.03.122

M3 - Article

VL - 483

SP - 10

EP - 18

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -