New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

Alexandra Lex, Gregor Trimmel, Wolfgang Kern, Peter Pacher, Robert Schennach, Oliver Werzer, Roland Resel, Anna Maria Track, Egbert Zojer, Georg Koller, Quan Shen, Gregor Hlawacek, Christian Teichert

Research output: Contribution to conferencePosterResearch

Original languageEnglish
Publication statusPublished - 2007
EventEMRS 2007 Spring Meeting - Strasbourg
Duration: 28 May 20072 Jun 2007

Conference

ConferenceEMRS 2007 Spring Meeting
CityStrasbourg
Period28/05/072/06/07

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)
  • Experimental

Cite this

Lex, A., Trimmel, G., Kern, W., Pacher, P., Schennach, R., Werzer, O., ... Teichert, C. (2007). New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. Poster session presented at EMRS 2007 Spring Meeting, Strasbourg, .

New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. / Lex, Alexandra; Trimmel, Gregor; Kern, Wolfgang; Pacher, Peter; Schennach, Robert; Werzer, Oliver; Resel, Roland; Track, Anna Maria; Zojer, Egbert; Koller, Georg; Shen, Quan; Hlawacek, Gregor; Teichert, Christian.

2007. Poster session presented at EMRS 2007 Spring Meeting, Strasbourg, .

Research output: Contribution to conferencePosterResearch

Lex, A, Trimmel, G, Kern, W, Pacher, P, Schennach, R, Werzer, O, Resel, R, Track, AM, Zojer, E, Koller, G, Shen, Q, Hlawacek, G & Teichert, C 2007, 'New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers' EMRS 2007 Spring Meeting, Strasbourg, 28/05/07 - 2/06/07, .
Lex A, Trimmel G, Kern W, Pacher P, Schennach R, Werzer O et al. New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. 2007. Poster session presented at EMRS 2007 Spring Meeting, Strasbourg, .
Lex, Alexandra ; Trimmel, Gregor ; Kern, Wolfgang ; Pacher, Peter ; Schennach, Robert ; Werzer, Oliver ; Resel, Roland ; Track, Anna Maria ; Zojer, Egbert ; Koller, Georg ; Shen, Quan ; Hlawacek, Gregor ; Teichert, Christian. / New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. Poster session presented at EMRS 2007 Spring Meeting, Strasbourg, .
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title = "New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers",
author = "Alexandra Lex and Gregor Trimmel and Wolfgang Kern and Peter Pacher and Robert Schennach and Oliver Werzer and Roland Resel and Track, {Anna Maria} and Egbert Zojer and Georg Koller and Quan Shen and Gregor Hlawacek and Christian Teichert",
year = "2007",
language = "English",
note = "EMRS 2007 Spring Meeting ; Conference date: 28-05-2007 Through 02-06-2007",

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TY - CONF

T1 - New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Kern, Wolfgang

AU - Pacher, Peter

AU - Schennach, Robert

AU - Werzer, Oliver

AU - Resel, Roland

AU - Track, Anna Maria

AU - Zojer, Egbert

AU - Koller, Georg

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Teichert, Christian

PY - 2007

Y1 - 2007

M3 - Poster

ER -