| Original language | English |
|---|---|
| Publication status | Published - 2007 |
| Event | EMRS 2007 Spring Meeting - Strasbourg Duration: 28 May 2007 → 2 Jun 2007 |
Conference
| Conference | EMRS 2007 Spring Meeting |
|---|---|
| City | Strasbourg |
| Period | 28/05/07 → 2/06/07 |
Treatment code (Nähere Zuordnung)
- Basic - Fundamental (Grundlagenforschung)
- Experimental
Cite this
New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers. / Lex, Alexandra; Trimmel, Gregor; Kern, Wolfgang; Pacher, Peter; Schennach, Robert; Werzer, Oliver; Resel, Roland; Track, Anna Maria; Zojer, Egbert; Koller, Georg; Shen, Quan; Hlawacek, Gregor; Teichert, Christian.
2007. Poster session presented at EMRS 2007 Spring Meeting, Strasbourg, .Research output: Contribution to conference › Poster › Research
}
TY - CONF
T1 - New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers
AU - Lex, Alexandra
AU - Trimmel, Gregor
AU - Kern, Wolfgang
AU - Pacher, Peter
AU - Schennach, Robert
AU - Werzer, Oliver
AU - Resel, Roland
AU - Track, Anna Maria
AU - Zojer, Egbert
AU - Koller, Georg
AU - Shen, Quan
AU - Hlawacek, Gregor
AU - Teichert, Christian
PY - 2007
Y1 - 2007
M3 - Poster
ER -