New photosensitive silane molecule for photochemical patterning of thin layers

Alexandra Lex, Peter Pacher, Robert Schennach, Q. Shen, Gregor Hlawacek, Christian Teichert, Oliver Werzer, Roland Resel, Egbert Zojer, Wolfgang Kern, Gregor Trimmel

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationScientific Programme: NFN Winter School
Publisher.
Pages52-52
Publication statusPublished - 2007

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