| Original language | English |
|---|---|
| Pages (from-to) | 044326-1-044326-9 |
| Journal | The journal of chemical physics |
| Volume | 140 |
| DOIs | |
| Publication status | Published - 2014 |
Fields of Expertise
- Advanced Materials Science
Treatment code (Nähere Zuordnung)
- Basic - Fundamental (Grundlagenforschung)
- Experimental
Cite this
Thaler, P., Volk, A., Ratschek, M., Koch, M., & Ernst, W. (2014). Molecular dynamics simulation of the deposition process of cold Ag-clusters under different landing conditions. The journal of chemical physics, 140, 044326-1-044326-9. https://doi.org/10.1063/1.4862917
Molecular dynamics simulation of the deposition process of cold Ag-clusters under different landing conditions. / Thaler, Philipp; Volk, Alexander; Ratschek, Martin; Koch, Markus; Ernst, Wolfgang.
In: The journal of chemical physics, Vol. 140, 2014, p. 044326-1-044326-9.Research output: Contribution to journal › Article › Research › peer-review
Thaler, P, Volk, A, Ratschek, M, Koch, M & Ernst, W 2014, 'Molecular dynamics simulation of the deposition process of cold Ag-clusters under different landing conditions' The journal of chemical physics, vol. 140, pp. 044326-1-044326-9. https://doi.org/10.1063/1.4862917
Thaler P, Volk A, Ratschek M, Koch M, Ernst W. Molecular dynamics simulation of the deposition process of cold Ag-clusters under different landing conditions. The journal of chemical physics. 2014;140:044326-1-044326-9. https://doi.org/10.1063/1.4862917
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author = "Philipp Thaler and Alexander Volk and Martin Ratschek and Markus Koch and Wolfgang Ernst",
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T1 - Molecular dynamics simulation of the deposition process of cold Ag-clusters under different landing conditions
AU - Thaler, Philipp
AU - Volk, Alexander
AU - Ratschek, Martin
AU - Koch, Markus
AU - Ernst, Wolfgang
PY - 2014
Y1 - 2014
U2 - 10.1063/1.4862917
DO - 10.1063/1.4862917
M3 - Article
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SP - 044326-1-044326-9
JO - The journal of chemical physics
JF - The journal of chemical physics
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