Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition

Lado Filipovic, Siegfried Selberherr, Giorgio Cataldo Mutinati, Elise Brunet, Stephan Steinhauer, Anton Köck, Jordi Teva, Jochen Kraft, Jörg Siegert, Franz Schrank, Christian Gspan, Werner Grogger

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publicationSimulation of Semiconductor Processes and Devices
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers
Pages208-211
ISBN (Print)978-1-4673-5736-4
DOIs
Publication statusPublished - 2013
EventInternational Conference on Simulation of Semiconductor Processes and Devices - Glasgow, United Kingdom
Duration: 3 Sep 20135 Sep 2013

Conference

ConferenceInternational Conference on Simulation of Semiconductor Processes and Devices
CountryUnited Kingdom
CityGlasgow
Period3/09/135/09/13

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Filipovic, L., Selberherr, S., Mutinati, G. C., Brunet, E., Steinhauer, S., Köck, A., ... Grogger, W. (2013). Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. In Simulation of Semiconductor Processes and Devices (pp. 208-211). Piscataway, NJ: Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/SISPAD.2013.6650611

Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. / Filipovic, Lado; Selberherr, Siegfried; Mutinati, Giorgio Cataldo; Brunet, Elise; Steinhauer, Stephan; Köck, Anton; Teva, Jordi; Kraft, Jochen; Siegert, Jörg; Schrank, Franz; Gspan, Christian; Grogger, Werner.

Simulation of Semiconductor Processes and Devices. Piscataway, NJ : Institute of Electrical and Electronics Engineers, 2013. p. 208-211.

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Filipovic, L, Selberherr, S, Mutinati, GC, Brunet, E, Steinhauer, S, Köck, A, Teva, J, Kraft, J, Siegert, J, Schrank, F, Gspan, C & Grogger, W 2013, Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. in Simulation of Semiconductor Processes and Devices. Institute of Electrical and Electronics Engineers, Piscataway, NJ, pp. 208-211, International Conference on Simulation of Semiconductor Processes and Devices, Glasgow, United Kingdom, 3/09/13. https://doi.org/10.1109/SISPAD.2013.6650611
Filipovic L, Selberherr S, Mutinati GC, Brunet E, Steinhauer S, Köck A et al. Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. In Simulation of Semiconductor Processes and Devices. Piscataway, NJ: Institute of Electrical and Electronics Engineers. 2013. p. 208-211 https://doi.org/10.1109/SISPAD.2013.6650611
Filipovic, Lado ; Selberherr, Siegfried ; Mutinati, Giorgio Cataldo ; Brunet, Elise ; Steinhauer, Stephan ; Köck, Anton ; Teva, Jordi ; Kraft, Jochen ; Siegert, Jörg ; Schrank, Franz ; Gspan, Christian ; Grogger, Werner. / Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition. Simulation of Semiconductor Processes and Devices. Piscataway, NJ : Institute of Electrical and Electronics Engineers, 2013. pp. 208-211
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