Modeling the Growth of Thin SnO2 Films using Spray Pyrolysis Deposition

Lado Filipovic, Siegfried Selberherr, Giorgio Cataldo Mutinati, Elise Brunet, Stephan Steinhauer, Anton Köck, Jordi Teva, Jochen Kraft, Jörg Siegert, Franz Schrank, Christian Gspan, Werner Grogger

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish
Title of host publicationSimulation of Semiconductor Processes and Devices
Place of PublicationPiscataway, NJ
PublisherInstitute of Electrical and Electronics Engineers
Pages208-211
ISBN (Print)978-1-4673-5736-4
DOIs
Publication statusPublished - 2013
EventInternational Conference on Simulation of Semiconductor Processes and Devices - Glasgow, United Kingdom
Duration: 3 Sep 20135 Sep 2013

Conference

ConferenceInternational Conference on Simulation of Semiconductor Processes and Devices
CountryUnited Kingdom
CityGlasgow
Period3/09/135/09/13

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

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