Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers

Martin Kleindienst, Stefan Koch, Markus Reichhartinger

Research output: Contribution to conferencePaper

Abstract

This paper proposes a model-based control approach for a liquid flow heater used to process silicon wafers in the semiconductor industry. A distributed-parameter model is presented to describe the thermal behavior of the heater. Adopting the early-lumping approach, an observer-based controller is designed. This controller ensures a vanishing steady state error in the case of constant input signals and disturbances. The implemented feedback loop relies on an anti-windup technique, which is based on the observer. Real-world tests demonstrate the effectiveness and feasibility of the proposed approach.
Original languageEnglish
Pages1023
Number of pages1028
Publication statusPublished - 2020
EventIEEE Conference on Control Technology and Applications (CCTA) - Montreal, Canada
Duration: 24 Aug 202026 Aug 2020

Conference

ConferenceIEEE Conference on Control Technology and Applications (CCTA)
CountryCanada
CityMontreal
Period24/08/2026/08/20

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    Kleindienst, M., Koch, S., & Reichhartinger, M. (2020). Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers. 1023. Paper presented at IEEE Conference on Control Technology and Applications (CCTA), Montreal, Canada.