Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers

Martin Kleindienst; Stefan Koch; Markus Reichhartinger

doi:10.1109/CCTA41146.2020.9206290

Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers

Martin Kleindienst, Stefan Koch, Markus Reichhartinger

Institute of Automation and Control (4430)

Research output: Chapter in Book/Report/Conference proceeding › Conference paper › peer-review

Abstract

This paper proposes a model-based control approach for a liquid flow heater operated within silicon wafer processing tools used in the semiconductor industry. A distributed-parameter model is presented to describe the thermal dynamic behavior of the heater. Adopting the early-lumping approach, an observer-based controller is designed. This controller ensures a vanishing steady-state error in the case of constant input signals and disturbances. The implemented feedback loop relies on an observer-based anti-windup technique. Real-world tests demonstrate the effectiveness and feasibility of the proposed approach.

Original language	English
Title of host publication	CCTA 2020 - 4th IEEE Conference on Control Technology and Applications
Pages	611-618
Number of pages	8
ISBN (Electronic)	9781728171401
DOIs	https://doi.org/10.1109/CCTA41146.2020.9206290
Publication status	Published - Aug 2020
Event	4th IEEE Conference on Control Technology and Applications: CCTA 2020 - Virtual, Montreal, Canada Duration: 24 Aug 2020 → 26 Aug 2020

Conference

Conference	4th IEEE Conference on Control Technology and Applications
Country/Territory	Canada
City	Virtual, Montreal
Period	24/08/20 → 26/08/20

ASJC Scopus subject areas

Control and Optimization
Instrumentation
Computer Science Applications

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10.1109/CCTA41146.2020.9206290

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Kleindienst, M, Koch, S & Reichhartinger, M 2020, Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers. in CCTA 2020 - 4th IEEE Conference on Control Technology and Applications., 9206290, pp. 611-618, 4th IEEE Conference on Control Technology and Applications, Virtual, Montreal, Canada, 24/08/20. https://doi.org/10.1109/CCTA41146.2020.9206290

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AB - This paper proposes a model-based control approach for a liquid flow heater operated within silicon wafer processing tools used in the semiconductor industry. A distributed-parameter model is presented to describe the thermal dynamic behavior of the heater. Adopting the early-lumping approach, an observer-based controller is designed. This controller ensures a vanishing steady-state error in the case of constant input signals and disturbances. The implemented feedback loop relies on an observer-based anti-windup technique. Real-world tests demonstrate the effectiveness and feasibility of the proposed approach.

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BT - CCTA 2020 - 4th IEEE Conference on Control Technology and Applications

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Y2 - 24 August 2020 through 26 August 2020

ER -

Model-based Temperature Control of a Continuous Flow Heater for Efficient Processing of Silicon Wafers

Abstract

Conference

ASJC Scopus subject areas

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