Micropattern formation by molecular migration via UV-induced dehydration of block copolymers

Kenji Okada, Yasuaki Tokudome, Rie Makiura, Kristina Konstas, Luca Malfatti, Plinio Innocenzi, Hiroki Ogawa, Toshiji Kanaya, Paolo Falcaro, Masahide Takahashi^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review