Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle.

Rudolf Stollberger, Paul Wach, Ch. Leussler, E. Justich

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Original languageEnglish
Title of host publicationProc. SMRM (Works in Progress), 8th Meeting
Publisher.
Pages1165-1165
Publication statusPublished - 1989

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Stollberger, R., Wach, P., Leussler, C., & Justich, E. (1989). Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. In Proc. SMRM (Works in Progress), 8th Meeting (pp. 1165-1165). ..

Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. / Stollberger, Rudolf; Wach, Paul; Leussler, Ch.; Justich, E.

Proc. SMRM (Works in Progress), 8th Meeting. ., 1989. p. 1165-1165.

Research output: Chapter in Book/Report/Conference proceedingConference contributionResearchpeer-review

Stollberger, R, Wach, P, Leussler, C & Justich, E 1989, Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. in Proc. SMRM (Works in Progress), 8th Meeting. ., pp. 1165-1165.
Stollberger R, Wach P, Leussler C, Justich E. Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. In Proc. SMRM (Works in Progress), 8th Meeting. . 1989. p. 1165-1165
Stollberger, Rudolf ; Wach, Paul ; Leussler, Ch. ; Justich, E. / Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. Proc. SMRM (Works in Progress), 8th Meeting. ., 1989. pp. 1165-1165
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