Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle

Rudolf Stollberger, Paul Wach, C. Leussler, E. Justich

Research output: Contribution to conferencePosterResearch

Original languageEnglish
Publication statusPublished - 1989
Event8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine - Amsterdam
Duration: 12 Aug 198918 Aug 1989

Conference

Conference8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine
CityAmsterdam
Period12/08/8918/08/89

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Stollberger, R., Wach, P., Leussler, C., & Justich, E. (1989). Intensity artefacts due to RF eddy and displacement currents and their dependence on setting of the flip angle. Poster session presented at 8th Annual Scientific Meeting and Exhibition Society of Magnetic Resonance in Medicine, Amsterdam, .