Influence of oxide processing on the defects at the SiC-SiO2 interface measured by electrically detected magnetic resonance

Gernot Gruber*, Thomas Aichinger, Gregor Pobegen, Dethard Peters, Markus Koch, Peter Hadley

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference paperpeer-review

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Chemistry

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