@article{a7e312e3bc774a92b0bec4db9bdafd92,
title = "Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating",
author = "Johannes Kofler and Kerstin Schmoltner and Andreas Klug and Emil List-Kratochvil",
year = "2014",
doi = "10.1088/0960-1317/24/9/095010",
language = "English",
volume = "24",
pages = "095010--1--095010--7",
journal = "Journal of Micromechanics and Microengineering",
issn = "0960-1317",
publisher = "IOP Publishing Ltd.",
number = "9",
}