Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Johannes Kofler, Kerstin Schmoltner, Andreas Klug, Emil List-Kratochvil

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)095010-1-095010-7
JournalJournal of Micromechanics and Microengineering
Volume24
Issue number9
DOIs
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this