Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Johannes Kofler; Kerstin Schmoltner; Andreas Klug; Emil List-Kratochvil

doi:10.1088/0960-1317/24/9/095010

Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Johannes Kofler, Kerstin Schmoltner, Andreas Klug, Emil List-Kratochvil

Institute of Solid State Physics (5130)

Research output: Contribution to journal › Article › Research › peer-review

Original language	English
Pages (from-to)	095010-1-095010-7
Journal	Journal of Micromechanics and Microengineering
Volume	24
Issue number	9
DOIs	https://doi.org/10.1088/0960-1317/24/9/095010
Publication status	Published - 2014

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Cite this

Kofler, J., Schmoltner, K., Klug, A., & List-Kratochvil, E. (2014). Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating. Journal of Micromechanics and Microengineering, 24(9), 095010-1-095010-7. https://doi.org/10.1088/0960-1317/24/9/095010

Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating. / Kofler, Johannes; Schmoltner, Kerstin; Klug, Andreas; List-Kratochvil, Emil.

In: Journal of Micromechanics and Microengineering, Vol. 24, No. 9, 2014, p. 095010-1-095010-7.

Research output: Contribution to journal › Article › Research › peer-review

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Access to Document

10.1088/0960-1317/24/9/095010