Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Johannes Kofler, Kerstin Schmoltner, Andreas Klug, Emil List-Kratochvil

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)095010-1-095010-7
JournalJournal of Micromechanics and Microengineering
Volume24
Issue number9
DOIs
Publication statusPublished - 2014

Fields of Expertise

  • Advanced Materials Science

Treatment code (Nähere Zuordnung)

  • Basic - Fundamental (Grundlagenforschung)

Cite this

Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating. / Kofler, Johannes; Schmoltner, Kerstin; Klug, Andreas; List-Kratochvil, Emil.

In: Journal of Micromechanics and Microengineering, Vol. 24, No. 9, 2014, p. 095010-1-095010-7.

Research output: Contribution to journalArticleResearchpeer-review

Kofler, Johannes ; Schmoltner, Kerstin ; Klug, Andreas ; List-Kratochvil, Emil. / Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating. In: Journal of Micromechanics and Microengineering. 2014 ; Vol. 24, No. 9. pp. 095010-1-095010-7.
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AU - List-Kratochvil, Emil

PY - 2014

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