Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Johannes Kofler; Kerstin Schmoltner; Andreas Klug; Emil List-Kratochvil

doi:10.1088/0960-1317/24/9/095010

Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Johannes Kofler, Kerstin Schmoltner, Andreas Klug, Emil List-Kratochvil

Institute of Solid State Physics (5130)

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	095010-1-095010-7
Journal	Journal of Micromechanics and Microengineering
Volume	24
Issue number	9
DOIs	https://doi.org/10.1088/0960-1317/24/9/095010
Publication status	Published - 2014

Fields of Expertise

Advanced Materials Science

Treatment code (Nähere Zuordnung)

Basic - Fundamental (Grundlagenforschung)

Access to Document

10.1088/0960-1317/24/9/095010

Cite this

Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating. / Kofler, Johannes; Schmoltner, Kerstin; Klug, Andreas; List-Kratochvil, Emil.

In: Journal of Micromechanics and Microengineering, Vol. 24, No. 9, 2014, p. 095010-1-095010-7.

Research output: Contribution to journal › Article › peer-review

@article{a7e312e3bc774a92b0bec4db9bdafd92,

title = "Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating",

author = "Johannes Kofler and Kerstin Schmoltner and Andreas Klug and Emil List-Kratochvil",

year = "2014",

doi = "10.1088/0960-1317/24/9/095010",

language = "English",

volume = "24",

pages = "095010--1--095010--7",

journal = "Journal of Micromechanics and Microengineering",

issn = "0960-1317",

publisher = "IOP Publishing Ltd.",

number = "9",

}

TY - JOUR

T1 - Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

AU - Kofler, Johannes

AU - Schmoltner, Kerstin

AU - Klug, Andreas

AU - List-Kratochvil, Emil

PY - 2014

Y1 - 2014

U2 - 10.1088/0960-1317/24/9/095010

DO - 10.1088/0960-1317/24/9/095010

M3 - Article

VL - 24

SP - 095010-1-095010-7

JO - Journal of Micromechanics and Microengineering

JF - Journal of Micromechanics and Microengineering

SN - 0960-1317

IS - 9

ER -