| Original language | English |
|---|---|
| Pages (from-to) | 095010-1-095010-7 |
| Journal | Journal of Micromechanics and Microengineering |
| Volume | 24 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2014 |
Fields of Expertise
- Advanced Materials Science
Treatment code (Nähere Zuordnung)
- Basic - Fundamental (Grundlagenforschung)
Cite this
Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating. / Kofler, Johannes; Schmoltner, Kerstin; Klug, Andreas; List-Kratochvil, Emil.
In: Journal of Micromechanics and Microengineering, Vol. 24, No. 9, 2014, p. 095010-1-095010-7.Research output: Contribution to journal › Article › Research › peer-review
}
TY - JOUR
T1 - Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating
AU - Kofler, Johannes
AU - Schmoltner, Kerstin
AU - Klug, Andreas
AU - List-Kratochvil, Emil
PY - 2014
Y1 - 2014
U2 - 10.1088/0960-1317/24/9/095010
DO - 10.1088/0960-1317/24/9/095010
M3 - Article
VL - 24
SP - 095010-1-095010-7
JO - Journal of Micromechanics and Microengineering
JF - Journal of Micromechanics and Microengineering
SN - 0960-1317
IS - 9
ER -